High performance of etch resistance on thermal shock resistance and high energy plasma, applicable to RTP and etcher chamber parts.
CVD SiC | Hot Pressed SiC | RB SiC | Sintered SiC | |
Purity | 99.999%+ | 97-99.9%+ | 99%+ | 99 |
Density (g cm-3) | 3.21 | 3.15-3.20 | 3.00-3.15 | 3.15 |
Porosity | negligible | <1% | <1% | 1-2% |
Thermal Conductivity(W m-1 K-1) | 250-300 | 100-180 | 100-150 | 100-140 |
Coefficient of Thermal Expansion (°C-1) | 4.4 x 10-6 | 4.5 x 10-6 | 4.5 x 10-6 | 4.2 x 10-6 |
Flexural Strength(103 psi) | 60-70 | 60-80 | 40-70 | 50-60 |
Elastic Modulus(106 psi) | 65 | 65 | 65 | 60 |